capability established by initial characterization. The “EH” version is acceptance tested on a wafer-by-wafer basis to 50krad(Si) at low dose rate. $ Electrically screened to SMD 5962-14208
起订量
1最小包装量--
添加到询价列表
ISL71091SEHVF10Renesascapability established by initial characterization. The “EH” version is acceptance tested on a wafer-by-wafer basis to 50krad(Si) at low dose rate. $ Electrically screened to SMD 5962-14208